Articles

Effect of process parameters and packing density on dimensional errors for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography

[+] Author Affiliations
Kaushal D. Vora

La Trobe University, Department of Physics, Bundoora 3086 Australia

Bor-Yaun Shew

National Synchrotron Radiation Research Center, Device Technology Group, 101, Hsin-Ann Road, 30077 Hsinchu SBI Park, Taiwan

Erol C. Harvey

Swinburne University of Technology, Industrial Research Institute of Swinburne, 543-545 Burwood Road, Hawthorn, Victoria 3122 Australia

Jasan P. Hayes

Swinburne University of Technology, Industrial Research Institute of Swinburne, 543-545 Burwood Road, Hawthorn, Victoria 3122 Australia

Andrew G. Peele

La Trobe University, Department of Physics, Bundoora 3086 Australia

J. Micro/Nanolith. MEMS MOEMS. 6(1), 013004 (March 12, 2007). doi:10.1117/1.2712869
History: Received September 29, 2006; Accepted October 10, 2006; Published March 12, 2007
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X-ray lithographic conditions for high-aspect-ratio SU-8 resist structures are characterized for potential application in x-ray optics and bioMEMS. The effects of the main process parameters, such as exposure dose, postexposure bake, development time, and the packing density of the microfabricated features, on the increase in feature size at the top portion of the resist (as compared to that in masks) are investigated. We find that lower postexposure bake and exposure dose leads toward minimizing dimensional errors. Further improvements in reducing the dimensional errors can be achieved by overdeveloping the structures. Using overdevelopment, we demonstrate an improvement in dimensional error for a given structure from 5 to 3.3%.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Kaushal D. Vora ; Bor-Yaun Shew ; Erol C. Harvey ; Jasan P. Hayes and Andrew G. Peele
"Effect of process parameters and packing density on dimensional errors for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography", J. Micro/Nanolith. MEMS MOEMS. 6(1), 013004 (March 12, 2007). ; http://dx.doi.org/10.1117/1.2712869


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