Articles

Characterization of collector optic material samples exposed to a discharge-produced plasma extreme ultraviolet light source

[+] Author Affiliations
Darren A. Alman, Huatan Qiu, T. Spila, Keith C. Thompson, Erik L. Antonsen, Brian E. Jurczyk, D. N. Ruzic

University of Illinois at Urbana-Champaign,Urbana, Illinois 61801

J. Micro/Nanolith. MEMS MOEMS. 6(1), 013006 (February 28, 2007). doi:10.1117/1.2437212
History: Received January 29, 2006; Revised September 22, 2006; Accepted September 27, 2006; Published February 28, 2007
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Extreme ultraviolet (EUV) light sources with efficient emission at 13.5nm are needed for next-generation lithography. A critical consideration in the development of such a source is the lifetime of collector optics. These experiments expose optics to a large flux of energetic particles coming from the expansion of the pulsed-plasma EUV source to investigate mirror damage due to erosion, layer mixing, and ion implantation. The debris ion spectra are analyzed using a spherical sector energy analyzer (ESA) showing ion energies of 2to13keV, including Xe+-Xe+4, Ar+, W+, Mo+, Fe+, Ni+, and Si+. Microanalysis is performed on samples exposed to 10 million pulses, including atomic force microscopy (AFM), showing increased roughness for most exposed samples. Notably, a Mo–Au Gibbsean segregated alloy showed surface smoothing over this time frame, suggesting that the segregation worked in situ. TRIM predictions for ion implantation are consistent with ion debris measurements from the ESA. Finally, time exposures of samples from 2, 20, and 40 million pulses show an initial roughening with smoothing of the exposed samples at longer time frames. Constant erosion is demonstrated with the SEM. These analyses give an experimental account of the effects of the ion debris field on optic samples exposed to the EUV source.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Darren A. Alman ; Huatan Qiu ; T. Spila ; Keith C. Thompson ; Erik L. Antonsen, et al.
"Characterization of collector optic material samples exposed to a discharge-produced plasma extreme ultraviolet light source", J. Micro/Nanolith. MEMS MOEMS. 6(1), 013006 (February 28, 2007). ; http://dx.doi.org/10.1117/1.2437212


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