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Reduced complexity compression algorithms for direct-write maskless lithography systems

[+] Author Affiliations
Hsin-I Liu

University of California, Berkeley, Department of Electrical Engineering and Computer Science, Berkeley, California

Vito Dai

University of California, Berkeley, Department of Electrical Engineering and Computer Science, Berkeley, California

Avideh Zakhor

University of California, Berkeley, Department of Electrical Engineering and Computer Science, Berkeley, California

Borivoje Nikolić

University of California, Berkeley, Department of Electrical Engineering and Computer Science, Berkeley, California

J. Micro/Nanolith. MEMS MOEMS. 6(1), 013007 (February 02, 2007). doi:10.1117/1.2435202
History: Received April 06, 2006; Revised October 02, 2006; Accepted October 09, 2006; Published February 02, 2007
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Achieving the throughput of one wafer layer per minute with a direct-write maskless lithography system, using 22-nm pixels for 45-nm feature sizes, requires data rates of about 12Tbs. In our previous work, we developed a novel lossless compression technique specifically tailored to flattened, rasterized, layout data called context copy combinatorial code (C4), which exceeds the compression efficiency of all other existing techniques including BZIP2, 2D-LZ, and LZ77, especially under a limited decoder buffer size, as required for hardware implementation. In this work, we present two variations of the C4 algorithm. The first variation, block C4, lowers the encoding time of C4 by several orders of magnitude, concurrently with lowering the decoder complexity. The second variation, which involves replacing the hierarchical combinatorial coding part of C4 with Golomb run-length coding, significantly reduces the decoder power and area as compared to block C4. We refer to this algorithm as block Golomb context copy code (block GC3). We present the detailed functional block diagrams of block C4 and block GC3 decoders, along with their hardware performance estimates as the first step of implementing the writer chip for maskless lithography.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Hsin-I Liu ; Vito Dai ; Avideh Zakhor and Borivoje Nikolić
"Reduced complexity compression algorithms for direct-write maskless lithography systems", J. Micro/Nanolith. MEMS MOEMS. 6(1), 013007 (February 02, 2007). ; http://dx.doi.org/10.1117/1.2435202


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