Articles

Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications

[+] Author Affiliations
Martin J. Neumann, Reece A. DeFrees, Huatan Qiu, David N. Ruzic

University of Illinois, Department of Nuclear, Plasma, and Radiological Engineering, 103 South Goodwin, Urbana, Illinois 61801

Oleh Khodykin, Alex Ershov

Cymer Corporation, 17075 Thornmint Court, San Diego, California 92127

Robert L. Bristol

Intel Corporation, Components Research RA3-252, 5200 NE Elam Young Parkway, Hillsboro, Oregon 97123

J. Micro/Nanolith. MEMS MOEMS. 6(2), 023005 (June 25, 2007). doi:10.1117/1.2750651
History: Received December 13, 2006; Revised March 06, 2007; Accepted March 14, 2007; Published June 25, 2007
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One of the critical issues within extreme ultraviolet lithography is mirror lifetime and the degradation due to debris from the pinch. This research investigated and showed the efficacy of using a helium secondary plasma and heat for removal of Li debris from collecting on the surface of collector optics. A He helicon plasma, which minimizes self-biasing and sputtering, has good extreme ultraviolet (EUV) photon wavelength transmission and preferential sputtering of lithium compared to other collector optics material. Through the combined use of heating and a He secondary plasma, EUV collector sample surface roughness and surface composition was able to be maintained near as-received status. The use of the He secondary plasma while the collector optics sample is exposed to Li debris shows promise as an in situ cleaning process for collector optics and can extend the lifetime of collector optics.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Martin J. Neumann ; Reece A. DeFrees ; Huatan Qiu ; David N. Ruzic ; Oleh Khodykin, et al.
"Plasma cleaning of lithium off of collector optics material for use in extreme ultraviolet lithography applications", J. Micro/Nanolith. MEMS MOEMS. 6(2), 023005 (June 25, 2007). ; http://dx.doi.org/10.1117/1.2750651


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