BIREFRINGENCE

Residual birefringence in photomask substrates

[+] Author Affiliations
Baoliang Bob Wang

Hinds Instruments Inc., 3175 NW Aloclek Drive, Hillsboro, Oregon?97124

J. Micro/Nanolith. MEMS MOEMS. 1(1), 43-48 (Apr 01, 2002). doi:10.1117/1.1445429
History: Received Aug. 9, 2001; Revised Nov. 20, 2001; Accepted Nov. 21, 2001
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Residual linear birefringence is an important property for quality control of optical components used in optical lithographic instruments. This paper shows that it is especially critical to control the residual linear birefringence in the substrate of photomasks at a very low level. A birefringence measurement system, known as Exicor®, was used for measuring both the magnitude and angular orientation of residual linear retardance in photomask substrates. Different patterns and levels of residual linear birefringence in these samples were identified. The effect of residual linear birefringence in photomask substrates, in determining wafer imaging quality, is discussed. © 2002 Society of Photo-Optical Instrumentation Engineers.

© 2002 Society of Photo-Optical Instrumentation Engineers

Citation

Baoliang Bob Wang
"Residual birefringence in photomask substrates", J. Micro/Nanolith. MEMS MOEMS. 1(1), 43-48 (Apr 01, 2002). ; http://dx.doi.org/10.1117/1.1445429


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