OPTICAL IMAGING

Linewidth variation characterization by spatial decomposition

[+] Author Affiliations
Alfred K. K. Wong

The University of Hong Kong, Department of Electrical and Electronic Engineering, Pokfulam Road, Hong Kong, People’s Republic of ChinaE-mail: awong@eee.hku.hk

Antoinette F. Molless, Timothy A. Brunner, Eric Coker, Robert H. Fair, George L. Mack, Scott M. Mansfield

IBM Semiconductor Research and Development Center, 2070 Route 52, Hopewell Junction, New York 12533

J. Micro/Nanolith. MEMS MOEMS. 1(2), 106-116 (Jul 01, 2002). doi:10.1117/1.1488159
History: Received Dec. 31, 2001; Revised Apr. 23, 2002; Accepted May 1, 2002; Online July 19, 2002
Text Size: A A A

Characterization of linewidth variation by a three-step methodology is presented. Via electrical linewidth measurement, sources of linewidth variation with distinct spatial signatures are first isolated by spatial analysis. Causes with similar spatial signatures are then separated by contributor-specific measurements. Unanticipated components are lastly identified by examination of the residuals from spatial analysis. Significant sources include photomask error, flare, aberrations, development nonuniformity, and scan direction asymmetry. These components are then synthesized to quantify the contributions from the three modules of the patterning process: photomask, exposure system, and postexposure processing. Although these modules are independent of one another, their effects on linewidth variation may be correlated. Moreover, the contributions of the modules are found to vary with exposure tool, development track, and lithography strategy. The most effective means to reducing the overall linewidth variation depends on the relative importance between these components. Optical proximity correction is efficacious only for a well-controlled process where proximity effect is the predominant cause of linewidth variation. © 2002 Society of Photo-Optical Instrumentation Engineers.

© 2002 Society of Photo-Optical Instrumentation Engineers

Citation

Alfred K. K. Wong ; Antoinette F. Molless ; Timothy A. Brunner ; Eric Coker ; Robert H. Fair, et al.
"Linewidth variation characterization by spatial decomposition", J. Micro/Nanolith. MEMS MOEMS. 1(2), 106-116 (Jul 01, 2002). ; http://dx.doi.org/10.1117/1.1488159


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.