ELECTRON BEAM LITHOGRAPHY

High-accuracy aerial image measurement for electron beam projection lithography

[+] Author Affiliations
Kazuaki Suzuki

Nikon Corporation, IC Equipment Division, Precision Equipment Company, 2nd Development Department, 201-9, Miizugahara, Kumagaya-Shi, Saitama, 360-8559, Japan E-mail: yahiro.pachi@nikon.co.jp

J. Micro/Nanolith. MEMS MOEMS. 1(2), 136-143 (Jul 01, 2002). doi:10.1117/1.1451082
History: Received Aug. 29, 2001; Revised Dec. 10, 2001; Accepted Dec. 27, 2001; Online July 19, 2002
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A direct means of measuring the image blur of electron beam projection lithography (EPL) tools is described. We developed an aerial image sensor using a Si membrane knife-edge and a transmitted electron detection technique. The aerial image sensor is designed to increase signal amplitude and signal contrast in order to yield a large signal to noise ratio even under a low beam current density condition. The image blur can be quantified accurate to a few nanometers because the measurement error due to the sensor is extremely small. The aerial image sensor was installed in Nikon’s electron beam projection experimental column and was evaluated. The measured image blur, defined as the distance between the 12% and 88% points of the beam edge profile, under the optimum condition was 13 nm, and the measurement repeatability was 3 nm (3 sigma). The application of this technique to a system calibration is demonstrated. Focus and astigmatism were measured and the optimum settings of focus coils and stigmators were determined with excellent repeatability. The potential for this technique to provide an automated self-calibration system on EPL tools is clearly shown. © 2002 Society of Photo-Optical Instrumentation Engineers.

© 2002 Society of Photo-Optical Instrumentation Engineers

Citation

Takehisa Yahiro ; Noriyuki Hirayanagi ; Takeshi Irita ; Hiroyasu Shimizu and Kazuaki Suzuki
"High-accuracy aerial image measurement for electron beam projection lithography", J. Micro/Nanolith. MEMS MOEMS. 1(2), 136-143 (Jul 01, 2002). ; http://dx.doi.org/10.1117/1.1451082


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