SPECIAL SECTION ON LITHOGRAPHY FOR SUB-100-NM DEVICE FABRICATION

Lithography for Sub-100-nm Device Fabrication

J. Micro/Nanolith. MEMS MOEMS. 1(3), 187 (Oct 01, 2002). doi:10.1117/1.1512300
History: Online October 11, 2002
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It is a great pleasure to introduce this special section of JM3 devoted to papers on the subject of lithography for sub-100-nm device fabrication. For many years, lithographers have wished for a home, peer-reviewed journal in which they could report the latest developments in the field in an archival format. The Journal of Microlithography, Microfabrication, and Microsystems attempts to provide lithographers with such a dedicated forum. Most issues will also include papers from the microsystems and microfabrication fields, but periodically there will be special sections on dedicated topics in microlithography—this is the first in this series.

© 2002 Society of Photo-Optical Instrumentation Engineers

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William H. Arnold, Senior Editor, Microlithography
"Lithography for Sub-100-nm Device Fabrication", J. Micro/Nanolith. MEMS MOEMS. 1(3), 187 (Oct 01, 2002). ; http://dx.doi.org/10.1117/1.1512300


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