SPECIAL SECTION ON LITHOGRAPHY FOR SUB-100-NM DEVICE FABRICATION

Performance enhancement of 157 nm Newtonian catadioptric objectives

[+] Author Affiliations
James Webb, Timothy Rich, Anthony Phillips, Jim Cornell

Corning Tropel Corporation, 60 O’Connor Road, Fairport, New York?14450 E-mail: webbj@corning.com

J. Micro/Nanolith. MEMS MOEMS. 1(3), 197-205 (Oct 01, 2002). doi:10.1117/1.1506373
History: Received Apr. 4, 2002; Revised June 24, 2002; Accepted July 8, 2002; Online October 11, 2002
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Newtonian design forms have been developed to explore high numerical aperture imaging systems at the wavelength of 157 nm with elements made of CaF2 crystal. First-generation systems working at 0.60 numerical aperature (NA) are currently printing features smaller than 130 nm for resist-process development. Second-generation design forms, working with variable numerical apertures above 0.75 NA, will push feature sizes significantly below 100 nm. Several aspects of second-generation designs have been improved to accommodate the need for characterizing and enhancing imaging performance. Closed-loop methods of optimization to reduce aberrations have been developed to characterize and control the effects of crystal-related birefringence on imagery. In addition these systems are learning vehicles to enhance knowledge of aberration-image performance dependence at high numerical apertures. © 2002 Society of Photo-Optical Instrumentation Engineers.

© 2002 Society of Photo-Optical Instrumentation Engineers

Citation

James Webb ; Timothy Rich ; Anthony Phillips and Jim Cornell
"Performance enhancement of 157 nm Newtonian catadioptric objectives", J. Micro/Nanolith. MEMS MOEMS. 1(3), 197-205 (Oct 01, 2002). ; http://dx.doi.org/10.1117/1.1506373


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