IMAGING SYSTEMS

Nikon electron beam projection lithography tool development summary

[+] Author Affiliations
Takaharu Miura, Tatsuo Sato, Masaya Miyazaki, Kazunari Hada, Yu Sato, Masateru Tokunaga, Yukio Kakizaki

Nikon Corporation, IC Equipment Division, General Manger of 3rd Development Department, 201-9, Miizugahara, Kumagaya City, Saitama Prefecture, 360-8559, Japan E-mail: miura.takaharu@nikonoa.net

J. Micro/Nanolith. MEMS MOEMS. 1(3), 313-319 (Oct 01, 2002). doi:10.1117/1.1504101
History: Received Mar. 1, 2002; Revised May 2, 2002; Accepted June 26, 2002; Online October 11, 2002
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In the development of the electron beam projection lithography (EPL) tool, one of the most important tasks is to develop the high-speed vacuum stage system and reliable vacuum body system. Nikon has a long history of over 22 years in precision stage development for its optical lithography tools as well as over 10 years in electron beam (EB) instrument development such as EB 60 with NTT. Recently, lithography stages have been developed based on air bearing and linear motor technologies. It is desirable and of minimum risk to utilize those technologies for the EPL system in order to shorten total time period of development, but the requirements for the EB stage and body are much different from their optical counterparts and much more difficult. In this paper, development and implementation of the EPL vacuum stage system, vacuum body system, vacuum loader system, and control system are discussed and overviewed. © 2002 Society of Photo-Optical Instrumentation Engineers.

© 2002 Society of Photo-Optical Instrumentation Engineers

Citation

Takaharu Miura ; Tatsuo Sato ; Masaya Miyazaki ; Kazunari Hada ; Yu Sato, et al.
"Nikon electron beam projection lithography tool development summary", J. Micro/Nanolith. MEMS MOEMS. 1(3), 313-319 (Oct 01, 2002). ; http://dx.doi.org/10.1117/1.1504101


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