Nikon electron beam projection lithography tool development summary

Takaharu Miura; Tatsuo Sato; Masaya Miyazaki; Kazunari Hada; Yu Sato; Masateru Tokunaga; Yukio Kakizaki

doi:10.1117/1.1504101

1 October 2002 Nikon electron beam projection lithography tool development summary

Takaharu Miura, Tatsuo Sato, Masaya Miyazaki, Kazunari Hada, Yu Sato, Masateru Tokunaga, Yukio Kakizaki

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 1, Issue 3, (October 2002). https://doi.org/10.1117/1.1504101

Abstract

In the development of the electron beam projection lithography (EPL) tool, one of the most important tasks is to develop the high-speed vacuum stage system and reliable vacuum body system. Nikon has a long history of over 22 years in precision stage development for its optical lithography tools as well as over 10 years in electron beam (EB) instrument development such as EB 60 with NTT. Recently, lithography stages have been developed based on air bearing and linear motor technologies. It is desirable and of minimum risk to utilize those technologies for the EPL system in order to shorten total time period of development, but the requirements for the EB stage and body are much different from their optical counterparts and much more difficult. In this paper, development and implementation of the EPL vacuum stage system, vacuum body system, vacuum loader system, and control system are discussed and overviewed.

©(2002) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Takaharu Miura, Tatsuo Sato, Masaya Miyazaki, Kazunari Hada, Yu Sato, Masateru Tokunaga, and Yukio Kakizaki "Nikon electron beam projection lithography tool development summary," Journal of Micro/Nanolithography, MEMS, and MOEMS 1(3), (1 October 2002). https://doi.org/10.1117/1.1504101

Published: 1 October 2002

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $24.00

Non-members: $28.00 ADD TO CART

JOURNAL ARTICLE
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Electron beams

Semiconducting wafers

Magnetism

Electron beam lithography

Reticles

Projection lithography

Metrology

Show All Keywords

Keywords/Phrases

Search In:

Publication Years