Editorial

Is There a Future in Microlithography?

J. Micro/Nanolith. MEMS MOEMS. 2(1), 5-6 (Jan 01, 2003). doi:10.1117/1.1536623
History: Online January 09, 2003
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This is the first issue of our journal in 2003. Looking over our publications up to the papers in this issue, practically all forms of microlithography have been covered, including extreme UV lithography (EUV), electron projection lithography (EPL), maskless lithography (ML2), electron-beam and ion-beam systems, and of course, the mainstream reduction dioptric systems using KrF, ArF, and F2 excimer lasers. The number of choices does not necessarily imply optimism. On the contrary, this is just the result of lacking a clear winner on which to focus our development efforts.

© 2003 Society of Photo-Optical Instrumentation Engineers

Citation

Burn J. Lin, Editor-in-Chief
"Is There a Future in Microlithography?", J. Micro/Nanolith. MEMS MOEMS. 2(1), 5-6 (Jan 01, 2003). ; http://dx.doi.org/10.1117/1.1536623


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