Large-field particle beam optics for projection and proximity printing and for maskless lithography

Hans Loeschner; Gerhard Stengl; Herbert Buschbeck; A. Chalupka; Gertraud Lammer; Elmar Platzgummer; Herbert Vonach; Patrick W.H. de Jager; Rainer Kaesmaier; Albrecht Ehrmann; Stefan Hirscher; Andreas Wolter; Andreas Dietzel; Ruediger Berger; Hubert Grimm; Bruce D. Terris; Wilhelm H. Bruenger; Gerhard Gross; Olaf K. Fortagne; Dieter Adam; Michael Boehm; Hans Eichhorn; Reinhard Springer; Joerg Butschke; Florian Letzkus; Paul Ruchhoeft; John Charles Wolfe

doi:10.1117/1.1528946

1 January 2003 Large-field particle beam optics for projection and proximity printing and for maskless lithography

Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick W.H. de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce D. Terris, Wilhelm H. Bruenger, Gerhard Gross, Olaf K. Fortagne, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, John Charles Wolfe

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 2, Issue 1, (January 2003). https://doi.org/10.1117/1.1528946

Abstract

Recent studies have shown the utility of ion projection lithography (IPL) for the manufacturing of integrated circuits. In addition, ion projection direct structuring (IPDS) can be used for resistless, noncontact modification of materials. In cooperation with IBM Storage Technology Division, ion projection patterning of magnetic media layers has been demonstrated. With masked ion beam proximity techniques, unique capabilities for lithography on nonplanar (curved) surfaces are outlined. Designs are presented for a masked ion beam proximity lithography (MIBL) and masked ion beam direct structuring (MIBS) tool with sub-20-nm resolution capability within 88-mm exposure fields. The possibility of extremely high reduction ratios (200:1) for high-volume projection maskless lithography (projection-ML2) is discussed. In the case of projection-ML2 there are advantages of using electrons instead of ions. Including gray scaling, an improved concept for a ≤50-nm projection-ML2 system is presented with the potential to meet a throughput of 20 wafers per hour (300 mm).

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick W.H. de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce D. Terris, Wilhelm H. Bruenger, Gerhard Gross, Olaf K. Fortagne, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, and John Charles Wolfe "Large-field particle beam optics for projection and proximity printing and for maskless lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 2(1), (1 January 2003). https://doi.org/10.1117/1.1528946

Published: 1 January 2003

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