New atomic force microscopy imaging for an inline large scale integration process monitor

Sumio Hosaka; Takafumi Morimoto; Hiroshi Kuroda; Yasushi Minomoto; Yukio Kembo; Hirokazu Koyabu

doi:10.1117/1.1530572

1 January 2003 New atomic force microscopy imaging for an inline large scale integration process monitor

Sumio Hosaka, Takafumi Morimoto, Hiroshi Kuroda, Yasushi Minomoto, Yukio Kembo, Hirokazu Koyabu

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 2, Issue 1, (January 2003). https://doi.org/10.1117/1.1530572

Abstract

New imaging techniques in atomic force microscopy have been developed to suppress bending of the sharpened probe during scanning. After analyzing the bending of the probe, it is clear that the bending is caused by response of servo control and slip of the probe on the slope. It is essential that we do not scan the probe under contact on a sample surface and we approach the surface at a contact force of <10 nN for slip-free operation. The technique controls the probe such that approaching and gap-controlling are done without scanning after the probe has been stepped from pixel to pixel, and the step movement is done after lifting the probe up from the sample surface without servo controlling. This technique permits us to use a very sharpened and slim probe so that we can observe a steep structure, such as a dry-etched groove and hole, and a photoresist pattern with a high aspect ratio faithfully. We clarify that it is possible to apply this technique to monitoring the steep structures with an inline process monitor in the large scale integration process without cracking the wafer.

©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Sumio Hosaka, Takafumi Morimoto, Hiroshi Kuroda, Yasushi Minomoto, Yukio Kembo, and Hirokazu Koyabu "New atomic force microscopy imaging for an inline large scale integration process monitor," Journal of Micro/Nanolithography, MEMS, and MOEMS 2(1), (1 January 2003). https://doi.org/10.1117/1.1530572

Published: 1 January 2003

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $24.00

Non-members: $28.00 ADD TO CART

JOURNAL ARTICLE
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Atomic force microscopy

Servomechanisms

Semiconducting wafers

Control systems

Error analysis

Image processing

Imaging systems

Show All Keywords

Keywords/Phrases

Search In:

Publication Years