Editorial

The 157-nm Good/Bad News from Intel

J. Micro/Nanolith. MEMS MOEMS. 2(3), 165-166 (Jul 01, 2003). doi:10.1117/1.1596195
History: Online July 07, 2003
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“Intel Corp. has revised its lithography strategy for the second time in the recent months, disclosing it has dropped 157-nm tools from its roadmap and is not pursuing the (157-nm) scanner technology for IC production. The move is expected to impact fab-tool and material vendors developing 157-nm products for Intel.” Reported by Mark LaPedus in Semiconductor Business News on May 23, 2003.

© 2003 Society of Photo-Optical Instrumentation Engineers

Citation

Burn J. Lin, Editor-in-Chief
"The 157-nm Good/Bad News from Intel", J. Micro/Nanolith. MEMS MOEMS. 2(3), 165-166 (Jul 01, 2003). ; http://dx.doi.org/10.1117/1.1596195


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