Editorial

The Microlithography Symposium and JM3

J. Micro/Nanolith. MEMS MOEMS. 2(4), 245 (Oct 01, 2003). doi:10.1117/1.1621873
History: Online October 03, 2003
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As I am writing this editorial, the 2004 SPIE Microlithography Symposium is nearing its closing date for paper submissions. When you are reading this editorial, you must be busy getting the work done in time for the February meeting. Some of you might have even started writing the proceedings article. Over the 27-year presence of the symposium, which was called Developments in Semiconductor Microlithography in 1976, there have been repeated outcries for a home journal of this symposium. Similar outcries were heard from the attendees of Photomask Technology, Photomask Japan, Micromachining and Micro-fabrication, Integrated Optoelectronic Devices, Smart Structures and Materials, and Microelectronic Manufacturing. Here, finally, is JM3, the home journal of these symposia, though not restricted to them. A dedicated team of editors, reviewers, and staff has been functioning. Seven issues have been published. However, the realization of the dream has barely started. In order to expedite the information flow, JM3 should aim to increase its publication frequency from quarterly to bimonthly and eventually to monthly. It takes at least 90 accepted papers annually to turn into a bimonthly, and at least 180 for a monthly. Attaining this frequency is beneficial to the readers but it requires more work from the authors and our team.

© 2003 Society of Photo-Optical Instrumentation Engineers

Citation

Burn J. Lin, Editor-in-Chief
"The Microlithography Symposium and JM3", J. Micro/Nanolith. MEMS MOEMS. 2(4), 245 (Oct 01, 2003). ; http://dx.doi.org/10.1117/1.1621873


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