Editorial

Hot-Lot Equivalent of Publishing—The Immersion Special Section

J. Micro/Nanolith. MEMS MOEMS. 3(1), 6 (Jan 01, 2004). doi:10.1117/1.1640618
History: Online February 17, 2004
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In semiconductor production, there are super-high-priority lots that are supposed to run nonstop. The total run time should be very close to the absolute processing time. The special section on immersion lithography in this issue is the journal equivalent of a wafer hot lot. After observing the eager attendance at the immersion presentations at the SPIE 2003 Microlithography Symposium in March, Bill Arnold and I thought that publishing a special section on immersion before the 2004 Microlithography Symposium would be very desirable for the readers of this journal. It would also be a great service for the authors to publish their findings at a record-breaking pace. Bill said he would give it a try and serve as the guest editor. What a try it was! We pulled out all the stops to make it happen. Authors were documenting their results fervently. Reviewers were doing their best to meet the deadlines without compromising publication quality. I learned of the reviewers’ quality work firsthand, because I was fortunate enough to have contributed two articles and co-authored a third. In such matters, I left the editorial decisions completely to Bill, like setting up a blind trust to avoid conflict of interest. He also asked me to serve in his role for papers from his company.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Burn J. Lin, Editor-in-Chief
"Hot-Lot Equivalent of Publishing—The Immersion Special Section", J. Micro/Nanolith. MEMS MOEMS. 3(1), 6 (Jan 01, 2004). ; http://dx.doi.org/10.1117/1.1640618


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