Lithography

Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process

[+] Author Affiliations
Gregory F. Nellis, Amr Y. Abdo, Roxann L. Engelstad, Eric P. Cotte

University of Wisconsin, Computational Mechanics Center, Department of Mechanical Engineering, Madison, Wisconsin 53706 E-mail: gfnellis@engr.wisc.edu

J. Micro/Nanolith. MEMS MOEMS. 3(1), 122-129 (Jan 01, 2004). doi:10.1117/1.1630313
History: Received Jun. 19, 2003; Revised Aug. 12, 2003; Accepted Aug. 13, 2003; Online February 17, 2004
Text Size: A A A

Optical lithography with 157-nm light is expected to bridge the gap between 193-nm technology and next-generation lithography. One important practical difficulty facing the implementation of 157-nm technology is gas absorption of 157-nm light. The exposure process for 193-nm technology is carried out in an air environment, but oxygen gas and water vapor severely attenuate 157-nm radiation. However, 157-nm exposure can be carried out in a nitrogen environment, which can be achieved by purging. A challenging aspect of the nitrogen purging process is the evacuation of the volume delineated by the pellicle frame, and the 800-μm-thick hard pellicle plate, which can fracture when subjected to an excessive pressure difference. A technique for pellicle purification via a cyclic purging and filling process is investigated. A theoretical analysis of the gas flow and pressure variation in the system is presented. The maximum stress induced in the hard pellicle during the process is predicted using finite element modeling. The minimum time for purification without causing excessive stress in the pellicle plate is estimated for a nominal set of conditions. Finally, a parametric analysis of important geometric variables including the size and number of purging holes as well as the filter resistance is presented. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Gregory F. Nellis ; Amr Y. Abdo ; Roxann L. Engelstad and Eric P. Cotte
"Theoretical analysis of 157-nm hard pellicle system purification via a cyclic purge/fill process", J. Micro/Nanolith. MEMS MOEMS. 3(1), 122-129 (Jan 01, 2004). ; http://dx.doi.org/10.1117/1.1630313


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.