Editorial

Hot-Lot Equivalent of Technology Development—Immersion Lithography

J. Micro/Nanolith. MEMS MOEMS. 3(2), 201 (Apr 01, 2004). doi:10.1117/1.1695567
History: Online March 31, 2004
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In semiconductor production, there are superhigh-priority lots that are supposed to run nonstop. The total run time should be very close to the absolute processing time. In the last editorial, I elaborated on the JM3 special section on immersion lithography being the journal equivalent of a wafer hot lot. This time, there is another hot-lot equivalent. It is in technology development. The subject matter is, again, immersion lithography.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Burn J. Lin
"Hot-Lot Equivalent of Technology Development—Immersion Lithography", J. Micro/Nanolith. MEMS MOEMS. 3(2), 201 (Apr 01, 2004). ; http://dx.doi.org/10.1117/1.1695567


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