Special Section on Mask Technology for Optical Lithography

Thermal response of optical reticles: experimental verification of finite element models

[+] Author Affiliations
Amr Y. Abdo, Roxann L. Engelstad, William A. Beckman, Edward G. Lovell

University of Wisconsin, Computational Mechanics Center, Department of Mechanical Engineering, 1513 University Avenue, Madison, Wisconsin?53706 E-mail: abdo@cae.wisc.edu

J. Micro/Nanolith. MEMS MOEMS. 3(2), 232-238 (Apr 01, 2004). doi:10.1117/1.1669489
History: Received Aug. 25, 2003; Revised Oct. 31, 2003; Accepted Nov. 4, 2003; Online March 31, 2004
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To extend optical lithography technology to the sub-65-nm linewidth regime, all mask-related distortions must be eliminated or minimized. Thermal distortion during the exposure process can be a significant contribution to the total pattern placement error budget for advanced photomasks. Consequently, several finite element (FE) models were developed to predict the thermal and mechanical response of an optical reticle during exposure. We present the experimental verification of the FE thermal models. In particular, the results of the numerical simulation are compared with the experimental data and excellent agreement is found. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Amr Y. Abdo ; Roxann L. Engelstad ; William A. Beckman and Edward G. Lovell
"Thermal response of optical reticles: experimental verification of finite element models", J. Micro/Nanolith. MEMS MOEMS. 3(2), 232-238 (Apr 01, 2004). ; http://dx.doi.org/10.1117/1.1669489


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