Thermal response of optical reticles: experimental verification of finite element models

Amr Y. Abdo; Roxann L. Engelstad; William A. Beckman; Edward G. Lovell

doi:10.1117/1.1669489

1 April 2004 Thermal response of optical reticles: experimental verification of finite element models

Amr Y. Abdo, Roxann L. Engelstad, William A. Beckman, Edward G. Lovell

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 3, Issue 2, (April 2004). https://doi.org/10.1117/1.1669489

Abstract

To extend optical lithography technology to the sub-65-nm linewidth regime, all mask-related distortions must be eliminated or minimized. Thermal distortion during the exposure process can be a significant contribution to the total pattern placement error budget for advanced photomasks. Consequently, several finite element (FE) models were developed to predict the thermal and mechanical response of an optical reticle during exposure. We present the experimental verification of the FE thermal models. In particular, the results of the numerical simulation are compared with the experimental data and excellent agreement is found.

©(2004) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Amr Y. Abdo, Roxann L. Engelstad, William A. Beckman, and Edward G. Lovell "Thermal response of optical reticles: experimental verification of finite element models," Journal of Micro/Nanolithography, MEMS, and MOEMS 3(2), (1 April 2004). https://doi.org/10.1117/1.1669489

Published: 1 April 2004

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