Special Section on Mask Technology for Optical Lithography

Effects of reticle reflectance on lithography

[+] Author Affiliations
Kevin D. Cummings

ASML TDC, 8555 South River Parkway, Tempe, Arizona 85284 E-mail: kevin.cummings@asml.com

Bernd Geh

Carl Zeiss/ASML TDC, 8555 South River Parkway, Tempe, Arizona 85284

Bing Lu, James Wasson, Pawitter Mangat

Motorola Inc., 2100 East Elliot Road, Tempe, Arizona 85284

J. Micro/Nanolith. MEMS MOEMS. 3(2), 263-268 (Apr 01, 2004). doi:10.1117/1.1668268
History: Received Sep. 2, 2003; Revised Jan. 8, 2004; Accepted Jan. 13, 2004; Online March 31, 2004
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We report in this work both experimental and theoretical results showing the effects of reticle absorber reflectivity on standard flare measurements, image formation, and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system and therefore should not limit lithography. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Kevin D. Cummings ; Bernd Geh ; Bing Lu ; James Wasson and Pawitter Mangat
"Effects of reticle reflectance on lithography", J. Micro/Nanolith. MEMS MOEMS. 3(2), 263-268 (Apr 01, 2004). ; http://dx.doi.org/10.1117/1.1668268


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