Special Section on Mask Technology for Optical Lithography

Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments

[+] Author Affiliations
Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn-Sheng Yu, Anthony Yen, Burn J. Lin

Taiwan Semiconductor Manufacturing Company, Limited, Exploratory Micropatterning Technology Department, Micropatterning Technology Division, Number 8 Li-Hsin Sixth Road, Science-Based Industrial Park, HsinChu, Taiwan

J. Micro/Nanolith. MEMS MOEMS. 3(2), 269-275 (Apr 01, 2004). doi:10.1117/1.1669508
History: Received Aug. 1, 2003; Revised Oct. 31, 2003; Accepted Dec. 19, 2003; Online March 31, 2004
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Three important concepts about the mask error enhancement factor (MEEF) are proposed. From the definition of MEEF, it could be derived as a function of the image log slope and the aerial image variation caused by mask critical dimension (CD) errors. Second, a mask error common window indicator (MECWIN) is proposed to evaluate the MEEF and mask CD specification by knowing the wafer CD tolerance. This concept is used to define the mask CD specification without any ambiguity. Finally, we describe the complex 2-D response to the mask-making error around the line end by a mask error enhancement tensor. Both theoretical derivations and experiments to justify the theory are presented. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Chun-Kuang Chen ; Tsai-Sheng Gau ; Jaw-Jung Shin ; Ru-Gun Liu ; Shinn-Sheng Yu, et al.
"Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments", J. Micro/Nanolith. MEMS MOEMS. 3(2), 269-275 (Apr 01, 2004). ; http://dx.doi.org/10.1117/1.1669508


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