Special Section on Mask Technology for Optical Lithography

Initial study of the fabrication of step and flash imprint lithography templates for the printing of contact holes

[+] Author Affiliations
Douglas J. Resnick, D. P. Mancini, K. J. Nordquist, W. J. Dauksher

Motorola Labs, 7700 South River Parkway, Tempe, AZ?85284 E-mail: doug.resnick@motorola.com

I. McMackin, P. Schumaker, E. Thompson, S. V. Sreenivasan

Molecular Imprints Incorporated, 1807-C West Braker Lane, Austin, TX?78758

J. Micro/Nanolith. MEMS MOEMS. 3(2), 316-321 (Apr 01, 2004). doi:10.1117/1.1683261
History: Received Aug. 5, 2003; Revised Sep. 8, 2003; Accepted Sep. 15, 2003; Online March 31, 2004
Text Size: A A A

Step and flash imprint lithography (S-FIL) is an attractive method for printing sub-100-nm geometries. Relative to other imprinting processes, S-FIL has the advantage of the template being transparent, thereby facilitating conventional overlay techniques. In addition, the imprint process is performed at low pressures and room temperature, minimizing magnification and distortion errors. As a result, it may be possible to use S-FIL to build integrated circuits. The purpose of this work is to investigate the fabrication methods needed to form templates capable of printing sub-100-nm contact holes. A positive resist process is used to image both holes and pillars on the template. After fabrication, the templates are used to print both contacts and pillars. The dense 80-nm imprinted contacts measure 65 nm, a consequence of undersizing on the template. For relaxed pitches, contacts smaller than 30 nm are observed. Pillars as small as 50 nm are also cleanly printed. At 40 nm, pillar size is inconsistent, and missing pillars are evident. Modifications to the template fabrication process will be necessary to study the feasibility of printing even smaller contacts and pillars. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Douglas J. Resnick ; D. P. Mancini ; K. J. Nordquist ; W. J. Dauksher ; I. McMackin, et al.
"Initial study of the fabrication of step and flash imprint lithography templates for the printing of contact holes", J. Micro/Nanolith. MEMS MOEMS. 3(2), 316-321 (Apr 01, 2004). ; http://dx.doi.org/10.1117/1.1683261


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.