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RESOLUTION ENHANCEMENT TECHNIQUES

Source optimization for image fidelity and throughput

[+] Author Affiliations
Yuri Granik

Mentor Graphics Corporation, 1001 Ridder Park Drive, San Jose, California?95131

J. Micro/Nanolith. MEMS MOEMS. 3(4), 509-522 (Oct 01, 2004). doi:10.1117/1.1794708
History: Received Feb. 2, 2004; Revised May 6, 2004; Accepted May 14, 2004; Online October 08, 2004
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In this study we first review existing source optimization methods. Lack of rigorous formulations motivates discussion of the optimization objectives and constraints. We stress the importance of using weighted and so-called Sobolev norms. Second, we state the main optimization problem as a set of the optimization objectives in a form of functional norm integrals to maximize image fidelity and source smoothness. We reduce this to a non-negative least square (NNLS) problem, which is solved by standard numerical methods. Third, we analyze solutions for important practical cases: alternating phase shifting applied to regular and semiregular pattern of contact holes, two types of SRAM cells with design rules from 130 to 250 nm, and a complex semidense contact layer pattern. Finally, we show how constraint optimization can be used to smooth strong off-axis quadrupole illuminations to achieve better image fidelity for some selected layout patterns. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Yuri Granik
"Source optimization for image fidelity and throughput", J. Micro/Nanolith. MEMS MOEMS. 3(4), 509-522 (Oct 01, 2004). ; http://dx.doi.org/10.1117/1.1794708


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