Fabrication by Electron Beams

Electron beam mastering process realized over a 100-GB/layer capacity disk

[+] Author Affiliations
Minoru Takeda, Motohiro Furuki, Masanobu Yamamoto, Masataka Shinoda, Kimihiro Saito

Sony Corporation, Optical Disc Development Division, Optical System Development Group, HENC, 6-7-35, Kitashinagawa, Shinagawa-ku, Tokyo?141-0001, Japan E-mail: minoru.takeda@jp.sony.com

Yuichi Aki, Hiroshi Kawase

Sony Corporation, Manufacturing Engineering Development Ctr., MSNC, 6-7-35, Kitashinagawa, Shinagawa-ku, Tokyo?141-0001, Japan

Mitsuru Koizumi, Toshiaki Miyokawa, Masao Mutou

JEOL Limited, Advanced Technology Division, 3-1-2, Musashino, Akishima-shi, Tokyo?196-8558, Japan

J. Micro/Nanolith. MEMS MOEMS. 3(4), 545-549 (Oct 01, 2004). doi:10.1117/1.1793154
History: Received Sep. 8, 2003; Revised Feb. 2, 2004; Accepted Feb. 4, 2004; Online October 08, 2004
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We demonstrate the capability of 100-GB density recording by electron beam mastering and readout by a near-field optical pickup with an effective NA of 2.05 and a blue LD of 405-nm wavelength. A silicon (Si) disk of 100-GB density is fabricated by an optimized Si etching process condition to form suitable pit pattern shapes for the near-field readout. © 2004 Society of Photo-Optical Instrumentation Engineers.

© 2004 Society of Photo-Optical Instrumentation Engineers

Citation

Minoru Takeda ; Motohiro Furuki ; Masanobu Yamamoto ; Masataka Shinoda ; Kimihiro Saito, et al.
"Electron beam mastering process realized over a 100-GB/layer capacity disk", J. Micro/Nanolith. MEMS MOEMS. 3(4), 545-549 (Oct 01, 2004). ; http://dx.doi.org/10.1117/1.1793154


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