Special Section on Next Generation Lithography

Emerging Lithographic Technologies

J. Micro/Nanolith. MEMS MOEMS. 4(1), 011001 (Mar. 10, 2005). doi:10.1117/1.1875654
History: Mar. 10, 2005; Online March 10, 2005
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This issue of the Journal of Microlithography, Microfabrication, and Microsystems contains a series of papers on evolving technologies. In January 2004, SEMATECH hosted a Lithography Forum that examined a number of technologies that have been prominent in the last few years. This two-day meeting brought together over 350 experts from around the world to listen to reviews of the technologies, ask questions, and reflect on the responses. The development progress of other technologies was presented in a poster session. The output of the forum was the results of a survey that the attendees completed. This special section captures elements of the presentations as a summary of the technology status in 2004.

© 2005 Society of Photo-Optical Instrumentation Engineers

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"Emerging Lithographic Technologies", J. Micro/Nanolith. MEMS MOEMS. 4(1), 011001 (Mar. 10, 2005). ; http://dx.doi.org/10.1117/1.1875654


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