Nanocomposite approaches toward pellicles for 157-nm lithography

Vladimir Liberman; Jan H. C. Sedlacek; Theodore H. Fedynyshyn; Russell B. Goodman; Mordechai Rothschild; Roger F. Sinta

doi:10.1117/1.1858131

1 January 2005 Nanocomposite approaches toward pellicles for 157-nm lithography

Vladimir Liberman, Jan H. C. Sedlacek, Theodore H. Fedynyshyn, Russell B. Goodman, Mordechai Rothschild, Roger F. Sinta

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 4, Issue 1, 013004 (January 2005). https://doi.org/10.1117/1.1858131

Abstract

Pellicle materials for use at 157 nm must display sufficient transparency at this wavelength and adequate lifetimes to be useful. We blended a leading candidate fluoropolymer with silica nanoparticles to examine the effect on both the transparency and lifetime of the pellicle. It is anticipated that these composite materials may increase the lifetime by perhaps quenching reactive species and/or by dilution, without severely decreasing the 157-nm transmission. Particles surface-modified with fluorinated moieties are also investigated. The additives are introduced as stable nanoparticle dispersions to casting solutions of the fluoropolymers. The properties of these solutions, films, and the radiation-induced darkening rates are reported. The latter are reduced in proportion to the dilution of the polymer, but there is no evidence that the nanoparticles act as radical scavengers.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Vladimir Liberman, Jan H. C. Sedlacek, Theodore H. Fedynyshyn, Russell B. Goodman, Mordechai Rothschild, and Roger F. Sinta "Nanocomposite approaches toward pellicles for 157-nm lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(1), 013004 (1 January 2005). https://doi.org/10.1117/1.1858131

Published: 1 January 2005

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