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Blazed silicon gratings fabricated by deflecting crystal orientation (111) silicon wafer

[+] Author Affiliations
Hui Ju, Ping Zhang, Jingqiu Liang, Shurong Wang, Yihui Wu

Chinese Academy of Sciences, The State Key Laboratory of Applied Optics, Changchun Institute of Optics and Fine Mechanics and Physics, Dong Nanhu Road 16, Changchun 1330002, China

J. Micro/Nanolith. MEMS MOEMS. 4(1), 019701 (Feb. 1, 2005). doi:10.1117/1.1857533
History: Received Jun. 5, 2003; Revised Jul. 15, 2004; Accepted Jul. 19, 2004; Feb. 1, 2005; Online February 01, 2005
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Bulk silicon wet etching can be used to fabricate silicon gratings. Wet etching depends on the anisotropic property of monocrystalline silicon. Blazed gratings for different spectral ranges can be fabricated by this method, and facets of grooves are formed by crystallographic planes of the monocrystalline silicon wafer. We develop a method to fabricate blazed gratings using deflecting crystal orientation (111) silicon wafers. The topographies of the samples are measured by SEM and atomic force microscopy (AFM), and the results indicate that the samples have grooves of good uniformity and facets of excellent optical quality. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Topics

Silicon ; Crystals

Citation

Hui Ju ; Ping Zhang ; Jingqiu Liang ; Shurong Wang and Yihui Wu
"Blazed silicon gratings fabricated by deflecting crystal orientation (111) silicon wafer", J. Micro/Nanolith. MEMS MOEMS. 4(1), 019701 (Feb. 1, 2005). ; http://dx.doi.org/10.1117/1.1857533


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