Editorial

New Insight for Maskless Lithography

J. Micro/Nanolith. MEMS MOEMS. 4(2), 020101 (Apr. 22, 2005). doi:10.1117/1.1904625
History: Apr. 22, 2005; Online April 22, 2005
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Two significant microlithography meetings took place in 2005: The ML2 workshop organized by International Sematech and the 2005 SPIE Microlithography Symposium. In the former meeting, more than 20 articles were presented or posted in one and half days. In the latter meeting, 6 articles on maskless lithography were presented or posted out of a total of 738 for the entire symposium. The total time it took was 1 hour and 20 minutes. Is ML2 neglected in the microlithography community?

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation


"New Insight for Maskless Lithography", J. Micro/Nanolith. MEMS MOEMS. 4(2), 020101 (Apr. 22, 2005). ; http://dx.doi.org/10.1117/1.1904625


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