Articles

Intensity imbalance in phase shift masks and correction by multiple exposures

[+] Author Affiliations
Moitreyee Mukherjee-Roy, Navab Singh, Sohan Singh Mehta

Institute of Microelectronics, 11 Science Park Road, Singapore Science Park II, Singapore-117685

Yasuki Kimura, Hideki Suda, Kazunori Nagai

Hoya Corporation, Mask Division, 1375 Kawaguchi-Cho, Hachioji-Shi, Tokyo—193 8525, Japan

J. Micro/Nanolith. MEMS MOEMS. 4(2), 023004 (Apr. 22, 2005). doi:10.1117/1.1898043
History: Received Jun. 14, 2004; Revised Aug. 24, 2004; Accepted Sep. 5, 2004; Apr. 22, 2005; Online April 22, 2005
Text Size: A A A

In this paper, the issue of intensity imbalance in an alternating phase shift mask has been studied for hole patterns with pitches 300 nm and below. A method of processing is developed, which would nullify the effects of phase errors that cause focus dependent difference in the sizes of holes belonging to opposite phases. This method uses two exposures with opposite foci. Using this method, the effect of the focus on the difference in the size of holes from opposite phases could be totally eliminated. It also changes the nature of the focus curve, bringing a significant improvement in the depth of focus without affecting exposure latitude and mask error enhancement factor. The method works quite effectively for all the via pitches, however, some constant size difference existed across focus, that is easily correctable by biasing one phase with respect to the other. It was also found that this technique could bring remarkable immunity against the lens aberrations such as defocus and astigmatism. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Moitreyee Mukherjee-Roy ; Navab Singh ; Sohan Singh Mehta ; Yasuki Kimura ; Hideki Suda, et al.
"Intensity imbalance in phase shift masks and correction by multiple exposures", J. Micro/Nanolith. MEMS MOEMS. 4(2), 023004 (Apr. 22, 2005). ; http://dx.doi.org/10.1117/1.1898043


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.