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Mathematical model for the surface relief formation of photographic emulsions

[+] Author Affiliations
Enrique Navarrete-Garcı´a, Sergio Calixto

Centro de Investigaciones en O´ptica, Apartado postal 1-948, Leo´n Gto., C.P. 37000, Me´xico E-mail: enavarre@cio.mx

J. Micro/Nanolith. MEMS MOEMS. 4(2), 023010 (May 4, 2005). doi:10.1117/1.1897385
History: Received May 28, 2004; Revised Oct. 9, 2004; Accepted Oct. 12, 2004; May 4, 2005; Online May 04, 2005
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We present a mathematical model of the surface relief formation suffered by photographic emulsions when an intensity pattern is recorded. Traditional explanations consider that this relief is due to silver compounds, but mainly to a mass transfer process in presence of tension forces. According to this description, the model considers diffusion and smoothing processes. Main parameters of the model were obtained by fitting simulated profiles to measured profiles for different micro-optical elements. The error between simulated and measured profiles ranged from 2.6% to 7.3%. Results obtained with this model reinforce the hypothesis of the surface relief formation. This model may be useful in numerical simulations of surface relief micro optical elements. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Enrique Navarrete-Garcı´a and Sergio Calixto
"Mathematical model for the surface relief formation of photographic emulsions", J. Micro/Nanolith. MEMS MOEMS. 4(2), 023010 (May 4, 2005). ; http://dx.doi.org/10.1117/1.1897385


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