Articles

General model for estimating bubble dissolution and droplet evaporation times

[+] Author Affiliations
Timothy A. Shedd

University of Wisconsin-Madison, Computational Mechanics Center, Department of Mechanical Engineering, 1500 Engineering Drive, Madison, Wisconsin 53706-1609

J. Micro/Nanolith. MEMS MOEMS. 4(3), 033004 (August 30, 2005). doi:10.1117/1.2037427
History: Received December 01, 2004; Accepted February 18, 2004; Published August 30, 2005
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Bubbles and droplets may be detrimental to the successful implementation of immersion lithography, depending in part on their lifetime in the system. In this work, a model is developed to estimate the dissolution times of nitrogen bubbles in pure water that may be free-floating or adhered to a solid surface. The model is then extended to small free and adhered droplets. Bubble dissolution and droplet evaporation times for typical immersion lithography conditions are presented.

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© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Timothy A. Shedd
"General model for estimating bubble dissolution and droplet evaporation times", J. Micro/Nanolith. MEMS MOEMS. 4(3), 033004 (August 30, 2005). ; http://dx.doi.org/10.1117/1.2037427


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