Articles

Optimal frequency coverages and parsings for imaging interferometric lithography

[+] Author Affiliations
Thanis M. Tridhavee

University of New Mexico, Department of Electrical Engineering and Computer Engineering, Albuquerque, New Mexico 87106

Balu Santhanam

University of New Mexico, Department of Electrical and Computer Engineering, Albuquerque, New Mexico 87131-1356

Steven R. J. Brueck

University of New Mexico, Center of High Technology Materials, 1313 Goddard SE, Albuquerque, New Mexico 87106

J. Micro/Nanolith. MEMS MOEMS. 4(3), 033005 (August 10, 2005). doi:10.1117/1.2008969
History: Received December 18, 2003; Revised December 13, 2004; Accepted February 08, 2005; Published August 10, 2005
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Imaging interferometric lithography (IIL) is an optical resolution enhancement technique, based on wavelength-division multiplexing, that combines off-axis illumination with multiple exposures and pupil filtering. In prior experiments, IIL was shown to be capable of improving the resolution of optics to subwavelength regimes but only in isolated parameter settings. The frequency parsing scheme plays a critical role in the resolution of aerial images from IIL and a platform for optimizing these frequency coverage parameters is currently lacking. We present three approaches to the optimization of IIL frequency coverage parameters. First, the exhaustive search approach and, then, the dynamic programming and greedy versions are presented. For unobstructed lenses and large numerical apertures, these approaches converge to frequency coverages with illumination points along the vertical and horizontal axes, while a lens with an obscured center results in a tilted frequency coverage. Two particular frequency parsing strategies are analyzed from the perspective of the quadratic term in the aerial intensity. Simulation results comparing the off-axis exposures with and without the on-axis exposure are presented. The effect of the quadratic terms on the exposure latitude is shown to have a positive effect in the dense edge areas and a negative effect on isolated edges.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Thanis M. Tridhavee ; Balu Santhanam and Steven R. J. Brueck
"Optimal frequency coverages and parsings for imaging interferometric lithography", J. Micro/Nanolith. MEMS MOEMS. 4(3), 033005 (August 10, 2005). ; http://dx.doi.org/10.1117/1.2008969


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