Articles

Image placement error: closing the gap between overlay and imaging

[+] Author Affiliations
Eric Hendrickx

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Alberto Colina

ASML, De Run 1110, 5503 LA Veldhoven, The Netherlands

Alex van der Hoff

ASML, De Run 1110, 5503 LA Veldhoven, The Netherlands

Jo Finders

ASML, De Run 1110, 5503 LA Veldhoven, The Netherlands

Geert Vandenberghe

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

J. Micro/Nanolith. MEMS MOEMS. 4(3), 033006 (September 02, 2005). doi:10.1117/1.2008229
History: Received August 17, 2004; Revised December 16, 2004; Accepted February 08, 2005; Published September 02, 2005
Text Size: A A A

We perform experimental and theoretical studies of image placement error induced by aberrations of the projection lens. The goal is to experimentally determine the magnitude of the image placement errors, to compare experiments and simulations, and to screen possible correction strategies. The calculations and experiments are done for ArF lithography. Theoretically, we simulate image placement error using the projection lens aberration data and simulators such as Prolith or Solid-C. Features with low and high sensitivities to lens aberrations are identified, together with a reference feature that has low sensitivity for image placement error. Dedicated reticles are fabricated to print various features at different illumination conditions on the same substrate. The resulting patterns could be analyzed using top-down scanning electron microscopy (SEM), but also optically with the standard optical overlay tool KLA5200. For both techniques, the experimentally found image placement errors are in excellent agreement with simulations. In simulations, we calculate the dependency of the image placement error on pattern density, pattern orientation, and illumination conditions. These tendencies are experimentally reproduced. We conclude with a case study that demonstrates a possible correction strategy for image placement error.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Eric Hendrickx ; Alberto Colina ; Alex van der Hoff ; Jo Finders and Geert Vandenberghe
"Image placement error: closing the gap between overlay and imaging", J. Micro/Nanolith. MEMS MOEMS. 4(3), 033006 (September 02, 2005). ; http://dx.doi.org/10.1117/1.2008229


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.