Short-wavelength ablation of molecular solids: pulse duration and wavelength effects

[+] Author Affiliations
Libor Juha, Michal Bittner, Dagmar Chvostová, Josef Krása, Michaela Kozlová, Miroslav Pfeifer, Jiri Polan, Ansgar R. Präg, Bedrich Rus, Michal Stupka

Academy of Sciences of the Czech Republic, Institute of Physics, Na Slovance 2, 182 21 Prague 8, Czech Republic

Josef Feldhaus

HASYLAB/DESY, Notkestrasse 85, D-22603 Hamburg, Germany

Vit Létal, Zdenek Otcenasek

Czech Technical University in Prague, Faculty of Nuclear Sciences and Physical Engineering, Brehova 7, 115 19 Prague 1, Czech Republic

Jacek Krzywinski, Robert Nietubyc, Jerzy B. Pelka

Polish Academy of Sciences, Institute of Physics, Al. Lotników 32/46, PL-02-668 Warsaw, Poland

Andrzej Andrejczuk

University of Bialystok , Institute of Experimental Physics, Lipowa 41, PL-15-424 Bialystok, Poland

Ryszard Sobierajski

Warsaw University of Technology, Ul.Sw A. Boboli 8, PL-02-525 Warsaw, Poland

Leszek Ryc

Institute of Plasma Physics and Laser Microfusion , Ul. Hery 23, PL-00-908 Warsaw, Poland

Frederick P. Boody

Ion Light Technologies GmbH , Lessingstrasse 2c, 93077 Bad Abbach, Germany

Henryk Fiedorowicz, Andrzej Bartnik, Janusz Mikolajczyk, Rafal Rakowski

Military University of Technology , Ul. Kaliskiego 2, PL-00-908 Warsaw, Poland

Pavel Kubát

Academy of Sciences of the Czech Republic , J. Heyrovský Institute of Physical Chemistry, Dolejškova 3, CZ-18223 Prague 8, Czech Republic

Ladislav Pína, Martin Horváth

Reflex sro , Novodvorská 994, 142 21 Praha 4, Czech Republic

Michael E. Grisham, Georgiy O. Vaschenko, Carmen S. Menoni, Jorge J. Rocca

Colorado State University , NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Fort Collins, Colorado 80523

J. Micro/Nanolith. MEMS MOEMS. 4(3), 033007 (August 30, 2005). doi:10.1117/1.2037467
History: Received November 10, 2004; Revised March 10, 2005; Accepted March 30, 2005; Published August 30, 2005
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For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (λ<100nm) lasers emitting pulses with durations ranging from 10fs to 1ns have recently been put into routine operation. This makes it possible to investigate how ablation characteristics depend on pulse duration in the XUV spectral region. Four sources of intense short-wavelength radiation available in the authors’ laboratories, including XUV and soft x-ray lasers, are used for the ablation experiments. Based on the results of the experiments, the etch rates for three different pulse durations are compared using the XUV-ABLATOR code to compensate for the wavelength difference. Comparing the values of etch rates calculated for nanosecond pulses with those measured for shorter pulses, we can study the influence of pulse duration on XUV ablation efficiency. The results of the experiments also show that the ablation rate increases while the wavelength decreases from the XUV spectral region toward x-rays, mainly due to increase of attenuation lengths at short wavelengths.

Figures in this Article
© 2005 Society of Photo-Optical Instrumentation Engineers


Libor Juha ; Michal Bittner ; Dagmar Chvostová ; Josef Krása ; Michaela Kozlová, et al.
"Short-wavelength ablation of molecular solids: pulse duration and wavelength effects", J. Micro/Nanolith. MEMS MOEMS. 4(3), 033007 (August 30, 2005). ;


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