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Fabrication of silicon submicrometer ribbons by glancing angle deposition

[+] Author Affiliations
Mark Summers

University of Alberta, Department of Electrical and Computer Engineering, Edmonton, Alberta T6G 2V4 , Canada

Barbara Djurfors

University of Alberta, Department of Chemical and Materials Engineering, Edmonton, Alberta T6G 2G6 , Canada

Michael Brett

University of Alberta, Department of Electrical and Computer Engineering, Edmonton, Alberta T6G 2V4 , Canada

J. Micro/Nanolith. MEMS MOEMS. 4(3), 033012 (August 30, 2005). doi:10.1117/1.2036991
History: Received September 24, 2004; Revised February 03, 2005; Accepted February 11, 2005; Published August 30, 2005
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Ribbon structures on the submicrometer scale are of interest for the development of nanodevices in various fields. We fabricate periodic arrays of silicon ribbons using electron beam lithography and thin film deposition at highly oblique incident angles. A periodicity of 1μm and a line width less than 100nm is used for the lithographically prepatterned substrate seed layers to ensure that the planar fill factor was less than the equilibrium volume fill factor of the thin film. Individual ribbons exhibit a width of approximately 1.8μm, controlled by the length of deposition, and a thickness of approximately 100nm. The ribbons fabricated for this experiment have a length of 4mm, and exhibit an amorphous structure with scattered crystallites throughout the matrix.

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© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Mark Summers ; Barbara Djurfors and Michael Brett
"Fabrication of silicon submicrometer ribbons by glancing angle deposition", J. Micro/Nanolith. MEMS MOEMS. 4(3), 033012 (August 30, 2005). ; http://dx.doi.org/10.1117/1.2036991


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