Special Section on Nanopatterning

Exploration of the ultimate patterning potential of focused ion beams

[+] Author Affiliations
J. Gierak, E. Bourhis, A. Madouri, M. Strassner, I. Sagnes, S. Bouchoule, M. N. Mérat Combes, D. Mailly

Laboratoire de Photonique et de Nanostructures, Centre National de la Recherche Scientifique (CNRS), Route de Nozay, F-91460 Marcoussis, France

P. Hawkes

Centre d'élaboration des matériaux et d'études structurales, Centre National de la Recherche Scientifique, 29 rue Jeanne Marvig, BP 4347, F-31055 Toulouse, France

R. Jede

RAITH GmbH, Hauert 18, Technologiepark, D-44227 Dortmund, Germany

L. Bardotti, B. Prével, A. Hannour, P. Mélinon, A. Perez

Laboratoire de Physique de la Matière Condensée et Nanostructures, UniversiténClaude Bernard, Lyon I et CNRS, 43 Bd du 11 Novembre 1918, F-69622 Villeurbanne, France

J. Ferré, J.-P. Jamet, A. Mougin

Laboratoire de Physique des Solides, UMR CNRS 8502, Univ. Paris Sud, F-91405 Orsay, France

C. Chappert, V. Mathet

Institut d'Electronique Fondamentale, UMR CNRS 8622, Univ. Paris Sud, F-91405 Orsay, France

J. Micro/Nanolith. MEMS MOEMS. 5(1), 011011 (March 24, 2006). doi:10.1117/1.2181581
History: Received February 01, 2005; Revised May 01, 2005; Accepted October 01, 2005; Published March 24, 2006
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We aim to explore the nanostructuring potential of a highly focused pencil of ions. We show that focused ion beam technology (FIB) is capable of overcoming some basic limitations of current nanofabrication techniques and allowing innovative patterning schemes for nanoscience. In this work, we first detail the very high resolution FIB instrument developed specifically to meet nanofabrication requirements. Then we introduce and illustrate some new patterning schemes for next-generation FIB processing. These patterning schemes are: 1. nanoengraving of membranes as a template for nanopores and nanomask fabrication; 2. local defect injection for magnetic thin film direct patterning; 3. function of graphite substrates to prepare 2-D organized arrays of clusters; and 5. selective epitaxy of III-V semiconductors on FIB patterned surfaces. Finally, we show that FIB patterning allows “bottom-up” or “organization” processes.

Figures in this Article
© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

J. Gierak ; E. Bourhis ; A. Madouri ; M. Strassner ; I. Sagnes, et al.
"Exploration of the ultimate patterning potential of focused ion beams", J. Micro/Nanolith. MEMS MOEMS. 5(1), 011011 (March 24, 2006). ; http://dx.doi.org/10.1117/1.2181581


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