Special Section on Nanopatterning

Laser interference as a lithographic nanopatterning tool

[+] Author Affiliations
Cees J. M. van Rijn

Technical University of Delft, Nano and Micro Engineered Structural Optimization, SOCM Group, Koiter Institute, Mekelweg 2, 2628 CD Delft, The Netherlands

J. Micro/Nanolith. MEMS MOEMS. 5(1), 011012 (February 27, 2006). doi:10.1117/1.2173269
History: Received March 01, 2005; Revised May 31, 2005; Accepted July 01, 2005; Published February 27, 2006
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Laser interference lithography is reviewed as an adequate nanopatterning tool for devices with periodic structures. The structure size may practically be chosen in the range between 100nm and 10.0μm by adjusting the angle of incidence θ of the incoming laser beam. The exposure method is fast, inexpensive, and applicable for large areas. The method may be used to fabricate microsieves, shadow masks, calibration grids, and photonic crystals.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Cees J. M. van Rijn
"Laser interference as a lithographic nanopatterning tool", J. Micro/Nanolith. MEMS MOEMS. 5(1), 011012 (February 27, 2006). ; http://dx.doi.org/10.1117/1.2173269


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