Special Section on Nanopatterning

Commercial importance of a unit cell: nanolithographic patenting trends for microsystems, microfabrication, and nanotechnology

[+] Author Affiliations
K. Eijkel

University of Twente, MESA+ Institute for Nanotechnology, Hogekamp/SP, De Veldmaat 10, Enschede, Netherlands 7522 NM

J. Hruby, G. Kubiak, M. Scott, J. Brokaw

Sandia National Laboratories, PO Box 969, Livermore, California 94551-0969

V. Saile

Univ Karlsruhe, Forschungszentrum Karlsruhe, IMT/BP 3640, Lepoldshafener Allee, Karlsruhe, 76021 Germany

Steven Walsh, Craig White

The University of New Mexico, PO Box 94465, Albuquerque, New Mexico 87199-4465

Daniel Walsh

California Polytechnic State University, San Luis Obispo, California 93407-0000

J. Micro/Nanolith. MEMS MOEMS. 5(1), 011014 (March 31, 2006). doi:10.1117/1.2183318
History: Received March 01, 2005; Revised September 01, 2005; Accepted October 01, 2005; Published March 31, 2006
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Microsystems and nanosystems hold the promise of new and much more effective approaches to both commercial and national security applications. The patenting rate in nanotechnology is exploding, underscoring its commercial and scientific potential. Yet how much of this effort is focused on nanopatterning or a top-down approach to nanofabrication? Nanopatterning in semiconductor microfabrication has already furthered Moore’s law, facilitating the transistor as that medium’s unit cell. Yet the search for a unit cell for the other two small technical markets (microsystems and the more broadbased nanotechnology) has proven much more elusive. Do nanopatterning advances hold the key to these technology bases finally obtaining a unit cell? We explore the intellectual property base of nanopatterning and how it pertains to semiconductor microfabrication, microsystems, and nanotechnology.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

K. Eijkel ; J. Hruby ; G. Kubiak ; M. Scott ; J. Brokaw, et al.
"Commercial importance of a unit cell: nanolithographic patenting trends for microsystems, microfabrication, and nanotechnology", J. Micro/Nanolith. MEMS MOEMS. 5(1), 011014 (March 31, 2006). ; http://dx.doi.org/10.1117/1.2183318


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