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Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering

[+] Author Affiliations
Ronald L. Jones, Christopher L. Soles, Eric K. Lin

National Institute of Standards and Technology,Polymers Division, Gaithersburg, Maryland 20899

Walter Hu, Ronald M. Reano, Stella W. Pang

University of Michigan,Department of Electrical Engineering and Computer Science, Ann Arbor, Michigan 48109

Steven J. Weigand, Denis T. Keane, John P. Quintana

Argonne National Laboratory,DND-CAT, Advanced Photon Source, Argonne, Illinois 60439

J. Micro/Nanolith. MEMS MOEMS. 5(1), 013001 (March 28, 2006). doi:10.1117/1.2170550
History: Received May 02, 2005; Revised September 26, 2005; Accepted September 26, 2005; Published March 28, 2006
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The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. Routine production of nanoscale patterns will require new metrologies capable of nondestructive dimensional measurements of both the mold and the pattern with subnanometer precision. In this work, a rapid, nondestructive technique termed critical dimension small angle x-ray scattering (CD-SAXS) is used to measure the cross sectional shape of both a pattern master, or mold, and the resulting imprinted films. CD-SAXS data are used to extract periodicity as well as pattern height, width, and sidewall angles. Films of varying materials are molded by thermal embossed NIL at temperatures both near and far from the bulk glass transition (TG). The polymer systems include a photoresist and two homopolymers. Our results indicate that molding at low temperatures (T-TG<40°C) produces small-aspect-ratio patterns that maintain periodicity to within a single nanometer, but feature large sidewall angles. While the observed pattern height does not reach that of the mold until very large imprinting temperatures (T-TG70°C), the pattern width of the mold is accurately transferred for T-TG>30°C.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Ronald L. Jones ; Christopher L. Soles ; Eric K. Lin ; Walter Hu ; Ronald M. Reano, et al.
"Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering", J. Micro/Nanolith. MEMS MOEMS. 5(1), 013001 (March 28, 2006). ; http://dx.doi.org/10.1117/1.2170550


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