Articles

Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography

[+] Author Affiliations
Deqiang Wang

Chinese Academy of Sciences, Institute of Microelectronics, Laboratory of Microprocessing and Nanotechnology, Beijing 100029 China

Leifeng Cao

China Academy of Engineering Physics (CAEP), Research Center of Laser Fusion, P.O. Box 919-986, Mianyang 621900 China

Chang-Qing Xie, Ming Liu, Tian-chun Ye

Chinese Academy of Sciences, Institute of Microelectronics, Laboratory of Microprocessing and Nanotechnology, Beijing 100029 China

J. Micro/Nanolith. MEMS MOEMS. 5(1), 013002 (February 06, 2006). doi:10.1117/1.2170110
History: Received May 22, 2005; Revised October 02, 2005; Accepted October 04, 2005; Published February 06, 2006
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We introduce a combined e-beam and x-ray lithographic method to fabricate microzone plates (MZP) on free-standing silicon nitride films. An automatic design program is developed to draw the complex layout of MZP with very smooth boundaries. A gold MZP master mask with a minimum ring width of 250nm is fabricated by e-beam lithography. The master mask is replicated using x-ray lithography (XRL) and nickel electroplating to obtain the final MZP. The combined lithographic technique produces a MZP with a pattern aspect ratio of 4.4:1.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Deqiang Wang ; Leifeng Cao ; Chang-Qing Xie ; Ming Liu and Tian-chun Ye
"Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography", J. Micro/Nanolith. MEMS MOEMS. 5(1), 013002 (February 06, 2006). ; http://dx.doi.org/10.1117/1.2170110


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