Articles

Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

[+] Author Affiliations
Saša Bajt

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Zu Rong Dai

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Erik J. Nelson

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Mark A. Wall

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Jennifer B. Alameda

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Nhan Q. Nguyen

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Sherry L. Baker

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Jeffrey C. Robinson

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

John S. Taylor

Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94550

Andrew Aquila

Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720

Nora Virginia Edwards

SEMATECH, Austin, Texas 78741-6499

J. Micro/Nanolith. MEMS MOEMS. 5(2), 023004 (May 12, 2006). doi:10.1117/1.2201027
History: Received October 13, 2005; Revised December 27, 2005; Accepted January 23, 2006; Published May 12, 2006
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The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on MoSi EUVL multilayers, are investigated to establish their baseline structural, optical, and surface properties in an as-deposited state. The same capping layer structures are then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure is analyzed in detail with transmission electron microscopy (TEM). Compared to other Ru-capping layer preparations studied here, it is the only one that shows grains with preferential orientation. This information is essential to model and optimize the performance of EUVL multilayers.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Saša Bajt ; Zu Rong Dai ; Erik J. Nelson ; Mark A. Wall ; Jennifer B. Alameda, et al.
"Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers", J. Micro/Nanolith. MEMS MOEMS. 5(2), 023004 (May 12, 2006). ; http://dx.doi.org/10.1117/1.2201027


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