Articles

Application of polysilazane to etch mask in pattern transfer processes for deep and vacuum ultraviolet lithography

[+] Author Affiliations
Yasuhiko Sato

Toshiba Corporation, Memory Division, Semiconductor Company, 800, Yamanoisshiki-Cho, Yokkaichi 512-8550, Japan

Junko Abe

Toshiba Corporation, Process and Manufacturing Engineering Center, Semiconductor Company, 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

J. Micro/Nanolith. MEMS MOEMS. 5(2), 023007 (May 10, 2006). doi:10.1117/1.2198841
History: Received October 02, 2005; Revised January 04, 2006; Accepted January 19, 2006; Published May 10, 2006
Text Size: A A A

A polysilazane is investigated for a spin-on glass (SOG) used for a middle layer in a trilevel resist system. Higher film density is required for the middle layer to obtain higher etch resistance during the underlayer etching. The compositions of the polysilazane baked at 200°C and 300°C are Si0.42O0.34C0.40N0.20 and Si0.29O0.65C0.10N0.05, respectively, which are determined by x-ray photoelectron spectroscopy. The polysilazane is converted to silicon-oxide-like compositions by baking at 300°C. The film density and etch rate of SOG made from polysilazane are compared with that of polysiloxsane on condition that both films are baked at 300°C. The film density of the SOG made from the polysilazane is 2.07gcm3, which is higher than 1.87gcm3 of the conventional SOG made from a polysiloxsan. The etch resistance of the SOG made from the polysilazane is improved by 90% compared with that of the SOG made from the polysiloxsane due to the increased film density.

Figures in this Article
© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Yasuhiko Sato and Junko Abe
"Application of polysilazane to etch mask in pattern transfer processes for deep and vacuum ultraviolet lithography", J. Micro/Nanolith. MEMS MOEMS. 5(2), 023007 (May 10, 2006). ; http://dx.doi.org/10.1117/1.2198841


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.