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Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography

[+] Author Affiliations
Shyamala Subramanian

The Pennsylvania State University, College of Engineering, Department of Engineering Science and Mechanics, 150 Materials Research Institute Building, University Park, Pennsylvania 16802

Jeffrey M. Catchmark

The Pennsylvania State University, Nanofabrication Facility, 189 Materials Research Institute Building, University Park, Pennsylvania 16802

J. Micro/Nanolith. MEMS MOEMS. 5(4), 049701 (November 30, 2006). doi:10.1117/1.2401140
History: Received June 22, 2006; Revised September 11, 2006; Accepted September 12, 2006; Published November 30, 2006
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Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.

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© 2006 Society of Photo-Optical Instrumentation Engineers

Citation

Shyamala Subramanian and Jeffrey M. Catchmark
"Molecular ruler lithography using sacrificial host structures fabricated using electron beam lithography", J. Micro/Nanolith. MEMS MOEMS. 5(4), 049701 (November 30, 2006). ; http://dx.doi.org/10.1117/1.2401140


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