Special Section on Resolution Enhancement Techniques and Design for Manufacturability

Performance-driven optical proximity correction for mask cost reduction

[+] Author Affiliations
Puneet Gupta

Blaze DFM, Incorporated, 1275 Orleans Drive, Sunnyvale, California 94089-1138

Andrew B. Kahng

University of California, San Diego, Department of Computer Science and Engineering, and, Department of Electrical and Computer Engineering, 9300 Gilman Drive, San Diego, California 92093-0114

Dennis Sylvester

University of Michigan, Department of Electrical Engineering and Computer Science, 1301 Beal Avenue, Ann Arbor, Michigan 48109-2122

Jie Yang

University of Michigan, Department of Electrical Engineering and Computer Science, 1301 Beal Avenue, Ann Arbor, Michigan 48109-2122

J. Micro/Nanolith. MEMS MOEMS. 6(3), 031005 (September 17, 2007). doi:10.1117/1.2774994
History: Received November 03, 2006; Revised March 16, 2007; Accepted April 17, 2007; Published September 17, 2007
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With continued aggressive process scaling in the subwavelength lithographic regime, resolution enhancement techniques (RETs) such as optical proximity correction (OPC) are an integral part of the design to mask flow. OPC creates complex features to the layout, resulting in mask data volume explosion and increased mask costs. Traditionally, the mask flow has suffered from a lack of design information, such that all features (whether critical or noncritical) are treated equally by RET insertion. We develop a novel minimum cost of correction (MinCorr) methodology to determine the level of correction of each layout feature, such that prescribed parametric yield is attained with minimum RET cost. This flow is implemented with model-based OPC explicitly driven by timing constraints. We apply a mathematical-programming-based slack budgeting algorithm to determine OPC level for all polysilicon gate geometries. Designs adopted with this methodology achieve up to 20% Manufacturing Electron Beam Exposure System (MEBES) data volume reduction and 39% OPC run-time improvement.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Puneet Gupta ; Andrew B. Kahng ; Dennis Sylvester and Jie Yang
"Performance-driven optical proximity correction for mask cost reduction", J. Micro/Nanolith. MEMS MOEMS. 6(3), 031005 (September 17, 2007). ; http://dx.doi.org/10.1117/1.2774994


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