Special Section on Resolution Enhancement Techniques and Design for Manufacturability

Through-process modeling for design-for-manufacturability applications

[+] Author Affiliations
Scott Mansfield

IBM Microelectronics, 2070 Route 52, Hopewell Junction, New York 12533

Geng Han

IBM Microelectronics, 2070 Route 52, Hopewell Junction, New York 12533

Lars Liebmann

IBM Microelectronics, 2070 Route 52, Hopewell Junction, New York 12533

J. Micro/Nanolith. MEMS MOEMS. 6(3), 031007 (September 21, 2007). doi:10.1117/1.2774987
History: Received October 27, 2006; Revised March 19, 2007; Accepted April 13, 2007; Published September 21, 2007
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In recent years, design for manufacturability (DFM) has become an important focus item of the semiconductor industry and many new DFM applications have arisen. Most of these applications rely heavily on the ability to model process sensitivity, and here we explore the role of through-process modeling on DFM applications. Several different DFM applications are examined and their lithography model requirements analyzed. The complexities of creating through-process models are then explored, and methods to ensure their accuracy presented.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Scott Mansfield ; Geng Han and Lars Liebmann
"Through-process modeling for design-for-manufacturability applications", J. Micro/Nanolith. MEMS MOEMS. 6(3), 031007 (September 21, 2007). ; http://dx.doi.org/10.1117/1.2774987


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