Articles

Impact of photoresist composition and polymer chain length on line edge roughness probed with a stochastic simulator

[+] Author Affiliations
Alexander Philippou, Thomas Mülders

Qimonda Dresden Gmbh and Company OHG, Königsbrücker Strasse 180, 01099 Dresden, Germany

Eckehard Schöll

Technische Universität Berlin, Institut für Theoretische Physik, Hardenbergstrasse 36, 10623 Berlin, Germany

J. Micro/Nanolith. MEMS MOEMS. 6(4), 043005 (December 03, 2007). doi:10.1117/1.2817656
History: Received April 03, 2007; Revised July 12, 2007; Accepted July 23, 2007; Published December 03, 2007
Text Size: A A A

The impact of various parameters such as photoacid generator (PAG) concentration, acid diffusion length, and polymer size on the finally obtained line edge roughness (LER) in chemically amplified photoresists are investigated with a stochastic simulator. A new aspect of the simulations is to start with a polymer matrix modeled by molecular dynamics simulation and subsequently simplify the description of the resist composition for mesoscopically simulating the post-exposure bake (PEB) and development steps. The results show that decreasing the molecular weight (MW) of chain-like polymers does not necessarily lead to lower roughness values. Acid-breakable polymers are simulated as well showing that they can lead to improved LER characteristics.

© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Alexander Philippou ; Thomas Mülders and Eckehard Schöll
"Impact of photoresist composition and polymer chain length on line edge roughness probed with a stochastic simulator", J. Micro/Nanolith. MEMS MOEMS. 6(4), 043005 (December 03, 2007). ; http://dx.doi.org/10.1117/1.2817656


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.