Articles

Wafer scale integration of catalyst dots into nonplanar microsystems

[+] Author Affiliations
Kjetil Gjerde

Technical University of Denmark, MIC—Department of Micro and Nanotechnology, Building 345 East, DK-2800 Kongens Lyngby, Denmark and Statoil ASA, Forusbeen 50, N-4035 Stavanger, Norway

Jakob Kjelstrup-Hansen

Technical University of Denmark, MIC—Department of Micro and Nanotechnology, Building 345 East, DK-2800 Kongens Lyngby, Denmark and University of Southern Denmark, Mads Clausen Institute, Alsion 2, DK-6400 Sønderborg, Denmark

Lauge Gammelgaard

Technical University of Denmark, MIC—Department of Micro and Nanotechnology, Building 345 East, DK-2800 Kongens Lyngby, Denmark

Peter Bøggild

Technical University of Denmark, MIC—Department of Micro and Nanotechnology, Building 345 East, DK-2800 Kongens Lyngby, Denmark

J. Micro/Nanolith. MEMS MOEMS. 6(4), 043014 (December 11, 2007). doi:10.1117/1.2811948
History: Received May 19, 2007; Revised August 07, 2007; Accepted August 10, 2007; Published December 11, 2007
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In order to successfully integrate bottom-up fabricated nanostructures such as carbon nanotubes or silicon, germanium, or III-V nanowires into microelectromechanical systems on a wafer scale, reliable ways of integrating catalyst dots are needed. Here, four methods for integrating sub-100-nm diameter nickel catalyst dots on a wafer scale are presented and compared. Three of the methods are based on a p-Si layer utilized as an in situ mask, an encapsulating layer, and a sacrificial window mask, respectively. All methods enable precise positioning of nickel catalyst dots at the end of a microcantilever, while avoiding contamination of the used cleanroom process equipment. The methods are suitable for fabrication of scanning probe tips and nanoelectrodes for advanced characterization probes.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Kjetil Gjerde ; Jakob Kjelstrup-Hansen ; Lauge Gammelgaard and Peter Bøggild
"Wafer scale integration of catalyst dots into nonplanar microsystems", J. Micro/Nanolith. MEMS MOEMS. 6(4), 043014 (December 11, 2007). ; http://dx.doi.org/10.1117/1.2811948


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