Articles

Photolithographic patterning of bihelical tracks onto conical substrates

[+] Author Affiliations
Alan Purvis, Richard McWilliam, Simon Johnson

Durham University, School of Engineering, Durham, DH1 3LE, United Kingdom

N. Luke Seed, Gavin L. Williams, Andrew Maiden

University of Sheffield, Department of Electronic and Electrical Engineering, Sheffield, S1 3JD, United Kingdom

Peter A. Ivey

Innotec Ltd, PO Box 2141, Calver, Hope Valley, S32 3YZ, United Kingdom

J. Micro/Nanolith. MEMS MOEMS. 6(4), 043015 (December 18, 2007). doi:10.1117/1.2824377
History: Received April 17, 2007; Revised July 02, 2007; Accepted September 11, 2007; Published December 18, 2007
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We demonstrate the direct photolithographic patterning of a grossly nonplanar substrate by creating 62-μm helical tracks on a 22-mm-high cone. The projection of focused light onto the 3-D surface is achieved using a computer-generated hologram (CGH) suitably illuminated so as to create the required pattern on the photoresist-coated surface. The approach adopted forms the basis of a novel method for patterning nonplanar structures. We address the key challenges encountered for the implementation of holographic photolithography in three dimensions, including mask design and manufacture, exposure compensation, mask alignment, and chemical processing. Control of linewidth and resolution over the nonplanar surface is critical. We describe the methods adopted and critically assess the structures created by this process. The bihelical cone is representative of a broadband, high-frequency coil-like structure, known in wireless communications as a log-periodic antenna.

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© 2007 Society of Photo-Optical Instrumentation Engineers

Citation

Alan Purvis ; Richard McWilliam ; Simon Johnson ; N. Luke Seed ; Gavin L. Williams, et al.
"Photolithographic patterning of bihelical tracks onto conical substrates", J. Micro/Nanolith. MEMS MOEMS. 6(4), 043015 (December 18, 2007). ; http://dx.doi.org/10.1117/1.2824377


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